采用直流磁控溅射方法，以K9玻璃为衬底制备掺铝氧化锌（ZnO：Al，AZO）薄膜。在300℃真空条件下对样品进行退火处理，研究不同退火时间对薄膜内部微观结构、表面形貌及光学特性的影响。结果表明，最佳退火时间为2 h，此条件下的AZO薄膜具有较强的（002）衍射峰，晶粒尺寸为17.2 nm，表面结构平整致密，紫外-可见波段的平均透射率为93.47%，光学带隙为3.41 eV。

为了探讨不同清洗工艺对基片表面微观粗糙度的影响, 利用总积分散射(TIS)仪分别对不同条件下超声清洗的K9玻璃基片,End-hall离子源清洗的K9玻璃基片和Kaufmann离子源清洗的熔石英基片的表面均方根(RMS)粗糙度进行了系统表征。结果表明, K9玻璃基片经不同条件下的超声波清洗后, 由于清洗过程中表面受到损伤, 其RMS粗糙度均有所增加; 而对于End-hall离子源和Kaufmann离子源清洗的基片, 其表面RMS粗糙度的变化受清洗过程中离子束流、清洗时间和离子束能量等实验参量的影响较为明显, 选择合适的实验参量可以降低基片表面粗糙度。

A series of thin Ag films with different thicknesses grown under identical conditions are analyzed by means of spectrophotometer. From these measurements the values of refractive index and extinction coefficient are calculated. The films are deposited onto BK7 glass substrates by direct current (DC) magnetron sputtering. It is found that the optical properties of the Ag films can be affected by films thickness. Below critical thickness of 17 nm, which is the thickness at which Ag films form continuous films, the optical properties and constants vary significantly with thickness increasing and then tend to a stable value up to about 40 nm. At the same time, X-ray diffraction measurement is carried out to examine the microstructure evolution of Ag films as a function of films thickness. The relation between optical properties and microstructure is discussed.